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Fabrication and processing

Buyer's guide > Fabrication and processing

Showing product 221 to 240 of 583 in Fabrication and processing.
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  1. Nanosurf NaioAFM
    Nanosurf AG Jan 15, 2014

    An all-in-one AFM for nano education and small samples.

  2. New range of Monochromatic Light Sources from LOT
    LOT-QuantumDesign Ltd Jan 14, 2014

    - Building on our extensive catalogue of incoherent light sources (Xe, Hg(Xe), QTH)

  3. NEW ILT950 UV Spectroradiometer
    LOT-QuantumDesign Ltd Jan 14, 2014

    The excellent performance of the original ILT950 spectroradiometer has been enhanced with the addition of a new machined optical bench for reduced stray light and improved thermal stability.

  4. Park Systems Unveils New Park XE15
    Park Systems Jan 6, 2014

    Powerfully Versatile Atomic Force Microscope with Unique MultiSample™ Scan.

  5. Phabler 100: Photolithography system for high-resolution photonic patterning
    EULITHA AG Dec 18, 2013

    "Phabler 100" is a unique photo-lithography system for printing periodic nano-structures, such as gratings and photonic crystals for research applications and low-volume production.

  6. High dynamical positioning system for semiconductor industry
    Piezosystem Jena GmbH Dec 13, 2013

    Precise movement in nanometer range with TRITOR 320 CAP

  7. Park Systems NX20 Atomic Force Microscope
    LOT-QuantumDesign Ltd Dec 11, 2013

    - the world’s most accurate large sample AFM (200mm sample stage)

  8. Introducing the Park Systems XE-7 Atomic Force Microscope
    LOT-QuantumDesign Ltd Dec 11, 2013

    - the most affordable research-grade AFM with flexible sample handling Special price of £35,000 + VAT (includes delivery, installation and user training)* * offer can be withdrawn without notice

  9. New Montana Instruments Nanoscale Workstation
    LOT-QuantumDesign Ltd Dec 11, 2013

    - a closed-cycle optical cryostat with an integrated cold breadboard

  10. ND-DC Dip Coater
    Nadetech Innovations S.L. Dec 3, 2013

    The Nadetech ND‐DC dip‐coater is a microprocessor controlled system developed for the fabrication of thin films by wet deposition.

  11. ND-SP Ultrasonic Spray Coater
    Nadetech Innovations S.L. Dec 3, 2013

    Nadetech Ultrasonic Spray Coater ND-SP is a system developed for the fabrication and deposition of thin films via spray.

  12. ND-SP Precision Spray Coater
    Nadetech Innovations S.L. Dec 3, 2013

    The Precision Spray Coater ND-SP is a system developed for the fabrication and deposition of thin films via spray.

  13. ND Multi Axis Layer-by-Layer Coater
    Nadetech Innovations S.L. Dec 3, 2013

    The Nadetech ND-2D & ND-3D Multi Axis Dip Coaters are a system developed for the fabrication of thin films by wet deposition.

  14. Silica Microspheres
    EPRUI Nanoparticles & Microspheres Co. Ltd. Dec 3, 2013

    EPRUI Nanoparticles&Microspheres Co.Ltd.cooperate tightly with top microspheres research centers in China and can supply monodisperse silica microspheres for labs,institutions,universities...

  15. Polystyrene Microspheres
    EPRUI Nanoparticles & Microspheres Co. Ltd. Dec 3, 2013

    EPRUI Nanoparticles&Microspheres Co.Ltd.cooperate with top microspheres research centers in China and can supply monodisperse silica microspheres for labs,institutions,universities...

  16. STE75 MBE System for III-V, II-VI and III-N compounds growth
    SemiTEq JSC Dec 3, 2013

    New compact MBE System for III-V, II-VI and III-N compounds growth

  17. STE3N3 MBE System for III-Nitrides growth
    SemiTEq JSC Dec 3, 2013

    Advanced MBE Systems for high-temperature epitaxial growth of III-Nitrides

  18. STE35 MBE System for conventional semiconductors growth in A3B5 systems
    SemiTEq JSC Dec 3, 2013

    STE35 is a modern technological platform for precise growth of epitaxial layers on wafers with diameter of 2”, 3”, 100 mm, as well as three 2” wafers on the same platen.

  19. STE3526 Two-reactor MBE complex for growth of hybrid heterostructures А3В5/А2В6
    SemiTEq JSC Dec 3, 2013

    Two-reactor STE3526 MBE System is specially designed for growth of hybrid heterostructures А3В5/А2В6 taking into account all specific of MBE growth of these material systems.

  20. STE ICP Technological platform for plasma chemical etching and deposition
    SemiTEq JSC Dec 3, 2013

    STE ICP series is intended in two basic modifications: STE ICPe (Plasma Chemical Etching) and STE ICPd (PECVD). Maximum diameter of wafers is up to 200 mm with possibility of using free shape samples.

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