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Plasma treatment

Buyer's guide > Fabrication and processing > Plasma treatment

Showing product 401 to 420 of 428 in Plasma treatment.
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  1. Nanocomposite Thin Films And Coatings: Processing, Properties and Performance
    World Scientific Publishing Co. May 3, 2011

    edited by Sam Zhang (Nanyang Technological University, Singapore) & Nasar Ali (University of Aveiro, Portugal)

  2. Annual Review of Nano Research
    World Scientific Publishing Co. May 3, 2011

    edited by Guozhong Cao (University of Washington, USA) & C Jeffrey Brinker (University of New Mexico & Sandia National Laboratories, USA)

  3. Nanofabrication: Fundamentals and Applications
    World Scientific Publishing Co. May 3, 2011

    edited by Ampere A Tseng (Arizona State University, USA)

  4. Nanoporous Materials: Proceedings of the 5th International Symposium
    World Scientific Publishing Co. May 3, 2011

    Vancouver, Canada, 25 – 28 May 2008
    edited by Abdelhamid Sayari (University of Ottawa, Canada) & Mietek Jaroniec (Kent State University, USA)

  5. Orion III - Plasma Enhanced Chemical Vapor Deposition (PECVD) System
    Trion Technology Mar 16, 2011

    The Orion III PECVD system produces production-quality films on a compact platform.

  6. Minilock-Phantom III - Reactive Ion Etcher (RIE) with a Vacuum Loadlock
    Trion Technology Mar 16, 2011

    The Minilock-Phantom III is the first RIE system in the industry to incorporate a vacuum load-lock on a compact platform.

  7. Phantom III - Reactive Ion Etch (RIE) System
    Trion Technology Mar 16, 2011

    Designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries.

  8. Minilock-Orion III: Loadlocked Plasma Enhanced Chemical Vapor Deposition (PECVD)
    Trion Technology Mar 16, 2011

    The Minilock-Orion III is a PECVD system with a vacuum loadlock that produces production-quality films on a compact platform.

  9. Sirus T2 - Table Top Reactive Ion Etch System
    Trion Technology Mar 16, 2011

    A basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment.

  10. EVG®770 Automated NIL Stepper
    EV Group Oct 18, 2010

    For step and repeat large area UV-Nanoimprinting processes (UV-NIL).

  11. Fiber Optic Splitter PLC Types
    Sunrise Intl Sep 29, 2010

    Fiber optic splitter is used to split one beam of optical fiber light into several parts at a certain ratio.

  12. Single mode to Multimode Fiber Optic Converter
    Sunrise Intl Sep 29, 2010

    We develop the single mode to multimode fiber converters for Gigabit network.

  13. Fiber Optic Video Transmitter/Receiver/Converter
    Sunrise Intl Sep 29, 2010

    fiber-optic video transceivers can simultaneously transmit different channels of 8-bit digitally encoded video/audio/Ethernet/Telephone/Dry contact over optical fiber.

  14. ESPion, an Advanced Langmuir Probe for Plasma Diagnostics
    Hiden Analytical Limited Sep 28, 2010

    The most advanced and reliable Langmuir Probe

  15. Sarfus 3D-IMM : New equipment for nanometric sample characterization in water
    NANOLANE Sep 14, 2010

    Nanolane is proud to announce the launch of its new equipment designed to match the needs of the research community, especially in the Life Science but also in Thin Film and Surface Treatment areas.

  16. EasyTube™ 101 Advanced CVD process development tool
    First Nano div of CVD Equipment Corporation Sep 2, 2010

    New CVD research and development tool platform part of the growing EasyTube™ products. Designed to address the budget limitations & growing safety concerns for the university or industrial researcher.

  17. EasyTube™ 2000 Advanced Catalytic CNT and Nanowire System
    First Nano div of CVD Equipment Corporation Sep 2, 2010

    Advanced turnkey thermal catalytic CVD process tool for the synthesis of a variety of nanotube and nanowire. The system is optimized for controlled process development and user safety.

  18. EasyTube™ 3000 Advanced Catalytic CNT and Nanowire CVD System
    First Nano div of CVD Equipment Corporation Sep 2, 2010

    Most advanced thermal chemical vapor deposition process tool for nanomaterials synthesis and thin film deposition. Capable of synthesizing a myriad of nanostructures and thin films.

  19. Application Lab - Nano/Solar/Energy material processes
    First Nano div of CVD Equipment Corporation Sep 2, 2010

    Offers access to our Application Lab where Nano/Solar/Energy material processes can be developed in conjunction with First Nano/CVD research scientists. Unassisted Lab time & assisted lab time.

  20. EasyTube™ 6000 Advanced Multi -Tube Furnace System
    First Nano div of CVD Equipment Corporation Sep 2, 2010

    Horizontal Furnace System is offered for Carbon Nanotubes (CNT), Nanowires, Oxidation, Annealing, Diffusion & Low Pressure Chemical Vapor Deposition (LPCVD). Cost savings of standardization.

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