Technology update
Sep 5, 2007
Doped nanowire transistors make their debut
Group IV semiconductor alloys are ideal for applications in electronics and optoelectronics thanks to their large range of crystal lattices and energy band gaps. Now, Moon-Ho Jo of Pohang University of Science and Technology in Korea and colleagues have made both n- and p-doped nanowire field-effect transistors (FETs) out of silicon and germanium for the first time. The result opens up the way for a wide range of applications, such as light-emitting diodes, photodetectors and high-speed logic circuits, for these materials.
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