Array fabrication
Bottom-up integration scheme used to fabricate NW resonator arrays. a, PNA probe molecules are attached to the NW surface. b, Electric-field forces are used to preferentially align single NWs in wells patterned in a sacrificial photoresist layer. The photoresist thickness at the base of the well determines the NW suspended height. c, Individual clamp windows are defined in a second photoresist layer. d, Metal clamps are electrodeposited around the NW tips. The photoresist is dissolved to suspend the clamped NWs and lift off any that are misaligned (unclamped). e, The NWs are exposed to fluorescently labelled complementary and noncomplementary targets to confirm detection selectivity. This integration method facilitates future electrical connection of single NWs to underlying Si circuitry. Credit image and text: Nature Nanotechnology.