Vistec Lithography, Inc. announced today that Yale University, New Haven, Connecticut, selected Vistec’s EBPG5000plus electron-beam lithography system for its future nanotechnology research programs. As part of the Yale Institute for Nanoscience and Quantum Engineering, it will enhance the effectiveness of research and education at Yale in emerging nanotechnology and will encourage multidisciplinary research involving Yale faculty, its students, and associated world-wide research partners.

The Yale EBPG5000plus represents the continued development of the highly successful EBPG product series. The high performance lithography system is based on reliable and well-proven system architecture. With further enhancements in resolution, noise reduction and beam stability, Yale’s Vistec EBPG5000plus is set to generate structures to less than 8nm on substrates up to 150mm in diameter, including fragments and special substrates. Its electron-optical column (TFE source) is rated for acceleration voltages of 20, 50, and 100kV. The system is equipped for true 100kV / 1mm performance under regular electron-optical conditions with a wide current capability for high throughput applications. The pattern generator operates at up to 50MHz. The system incorporates an interactive graphical user interface (GUI) that provides ease of use for diverse, multiuser, university type environments.

"The acquisition of the Vistec EBPG5000plus will enable the Yale research community to explore the expanding field of nanotechnology with a state-of-the-art electron-beam lithography patterning system. We will utilize the system for a wide variety of applications including Applied Physics, Electrical Engineering and Bio-technology. The Vistec system will allow Yale to remain at the forefront of nanotechnology today and well into the future", said Dr. Michael Rooks, Facilities Director of the Yale Institute for Nanoscience and Quantum Engineering. "The EBPG system will provide the Yale community with not only high quality nanolithography patterning, but with high flexibility and user friendliness for our various multidisciplinary activities. Vistec’s system is perfect for our nanotechnology requirements."

"Vistec is pleased to be associated with Yale University. We look forward to our co-operation with Yale’s leading edge nanotechnology researchers and their programs", noted Rainer Schmid, General Manager Vistec Lithography, Inc. "Vistec’s association with Yale and its electron-beam research scientists will hopefully lead to further software and hardware enhancements for our highly successful EBPG series."

About Yale Institute for Nanoscience and Quantum Engineering
The Yale Institute for Nanoscience and Quantum Engineering (YINQE) is a new initiative at Yale University intended to provide nanofabrication, microscopy and materials characterization to disparate scientific disciplines centered on nanoscale research projects. YINQE builds on existing research strengths in engineering and the physical and life sciences to broaden interdisciplinary activity among faculty and students across the entire campus. The Institute provides improved nanomaterials fabrication capabilities, together with centralized shared characterization. These facilities complement Yale’s microelectronics clean room, computational facilities and materials synthesis laboratories. See http://nano.yale.edu for more information.

About Vistec Electron Beam Lithography Group
The Vistec Electron Beam Lithography Group is a global manufacturer and supplier of electron-beam lithography systems with applications ranging from nano and bio-technology to photonics and industrial environments like mask making or direct writing for fast prototype development and design evaluation. The Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.

About Vistec Lithography
Vistec Lithography develops, manufactures, and sells electron-beam lithography equipment based on Gaussian Beam technology. Their electron-beam systems are world-wide accepted in advanced research laboratories and universities. The company is located in Watervliet, NY (USA), within the Capital Region of New York.

About Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on Shaped Beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron-beam systems are used for microchip production and integrated optics as well as for scientific and commercial research. The company is located in Jena (Germany).

Source: www.vistec-semi.com