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  1. ND-SP Precision Spray Coater
    Nadetech Innovations S.L. Dec 3, 2013

    The Precision Spray Coater ND-SP is a system developed for the fabrication and deposition of thin films via spray.

  2. ND Multi Axis Layer-by-Layer Coater
    Nadetech Innovations S.L. Dec 3, 2013

    The Nadetech ND-2D & ND-3D Multi Axis Dip Coaters are a system developed for the fabrication of thin films by wet deposition.

  3. Silica Microspheres
    EPRUI Nanoparticles & Microspheres Co. Ltd. Dec 3, 2013

    EPRUI Nanoparticles&Microspheres Co.Ltd.cooperate tightly with top microspheres research centers in China and can supply monodisperse silica microspheres for labs,institutions,universities...

  4. Polystyrene Microspheres
    EPRUI Nanoparticles & Microspheres Co. Ltd. Dec 3, 2013

    EPRUI Nanoparticles&Microspheres Co.Ltd.cooperate with top microspheres research centers in China and can supply monodisperse silica microspheres for labs,institutions,universities...

  5. High Intensity Focused Ultrasound Transducers
    Piezo Technologies Dec 3, 2013

    Piezo Technologies has the advanced high drive materials, transducer designs, and manufacturing reliability to help bring your product to market.

  6. STE75 MBE System for III-V, II-VI and III-N compounds growth
    SemiTEq JSC Dec 3, 2013

    New compact MBE System for III-V, II-VI and III-N compounds growth

  7. STE3N3 MBE System for III-Nitrides growth
    SemiTEq JSC Dec 3, 2013

    Advanced MBE Systems for high-temperature epitaxial growth of III-Nitrides

  8. STE35 MBE System for conventional semiconductors growth in A3B5 systems
    SemiTEq JSC Dec 3, 2013

    STE35 is a modern technological platform for precise growth of epitaxial layers on wafers with diameter of 2”, 3”, 100 mm, as well as three 2” wafers on the same platen.

  9. STE3526 Two-reactor MBE complex for growth of hybrid heterostructures А3В5/А2В6
    SemiTEq JSC Dec 3, 2013

    Two-reactor STE3526 MBE System is specially designed for growth of hybrid heterostructures А3В5/А2В6 taking into account all specific of MBE growth of these material systems.

  10. STE ICP Technological platform for plasma chemical etching and deposition
    SemiTEq JSC Dec 3, 2013

    STE ICP series is intended in two basic modifications: STE ICPe (Plasma Chemical Etching) and STE ICPd (PECVD). Maximum diameter of wafers is up to 200 mm with possibility of using free shape samples.