Trion Technology May 12, 2010
About this company
2131 Sunnydale Blvd.
Since its founding in 1989, Trion Technology, Inc. has become the largest domestic US supplier of custom Plasma Etch and Deposition Equipment for the Compound Semiconductor, MEMS, Opto-Electronic and other markets. http://www.triontech.com
Products from this company
The Orion III PECVD system produces production-quality films on a compact platform.
The Minilock-Phantom III is the first RIE system in the industry to incorporate a vacuum load-lock on a compact platform.
Phantom III - Reactive Ion Etch (RIE) System Mar 16, 2011
Designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries.
The Minilock-Orion III is a PECVD system with a vacuum loadlock that produces production-quality films on a compact platform.
Sirus T2 - Table Top Reactive Ion Etch System Mar 16, 2011
A basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment.