Quorum Technologies Oct 14, 2013
About this company
Fax: +44(0)1323 811999
Quorum Technologies makes instruments for electron microscopy (EM) specimen preparation. These include the market leading Q series of sputter/carbon coaters and PP3010T cryo preparation for SEM - plus a compact, benchtop RF plasma etcher/asher
Quorum offers a range of instrumentation primarily used in electron microscopy specimen preparation and for thin-film coating applications.
The compact "Q" series of coaters is available in a range of formats to suite SEM and TEM specimen coating applications. The Q300 is a larger coater designed for semiconductor wafers and is available with a dual head to allow the sequential coating of two metals without having to "break" vacuum.
The market-leading PP3010T is the latest in cryo-SEM technology and combines the highest quality results with unparalleled ease of use. The PP3010T is a highly automated, easy to use, column-mounted, gas-cooled cryo preparation system suitable for most makes and models of SEM, FE-SEM and FIB/SEM.
Other products include EM freezer dryers, critical point dryers and a compact bench top RF plasma etcher/asher/cleaner.
All products come with a three-year warranty and are sold and supported by a comprehensive worldwide distribution network.
Products from this company
The SEMCool is based on the PP3006 CoolLok but without the PP3004 QuickLok components. It is designed for cryogenic applications where airlock exchange of specimens into the microscope is not required
The Q300T ES is a large chamber, turbomolecular-pumped coating system ideally suited to metal evaporation onto large diameter specimens up to 6”/152mm (eg. a wafer) or smaller multiple specimens
PP3006 CoolLok Cryo Transfer System Aug 13, 2015
For SEM, FIB/SEM, Beamline and Vacuum Platforms www.quorumtech.com/pp3006-cryo-transfer-system.html
PP3004 QuickLok Aug 13, 2015
PP3004 QuickLok Ambient temperature airlock for SEM, FIB/SEM, beamline and other vacuum platforms.
E3100 Critical Point Dryer Aug 13, 2015
The E3100 are low cost, simple to use critical point dryers designed primarily for processing scanning electron microscopy (SEM) specimens.
Quorum Technologies is proud to receive the Queen’s Award for International Trade.
Quorum Technologies has moved Aug 14, 2013
Quorum Technologies has recently relocated to a new, purpose-built factory and offices in the village of Laughton in East Sussex...
The turbo-pumped Q150GB is a modular glove box coater suitable for SEM/TEM and thin-film applications. The Q150GB includes sputtering and carbon rod evaporation and has options for metal evaporation
Quorum Technologies is pleased to introduce the Q150GB – a fully automatic, modular glove box version of the market leading Q150T ES bench top turbomolecular-pumped coating system.
The market-leading PP3010T is the latest in cryo-SEM technology and combines the highest quality results with unparalleled ease of use. It can be used with most models of SEM, FE-SEM and FIB/SEM.
K975X/K975S Turbo-Pumped Thermal Evaporators Mar 11, 2013
The K975X is a compact, bench-mounted, multiple application thermal evaporator for vacuum deposition of thin layers of carbon and metals. The K975S will coat an 8” wafer or large specimen with carbon
K850WM Large Chamber Wafer Critical Point Dryer Mar 11, 2013
The K850WM is compact, bench-top instrument designed to critical point dry a complete 6"/150mm wafer. A convenient wafer holder allows rapid transfer and ensures that pre-drying does not occur.
Q150T Turbo-Pumped Sputter Coater/Carbon Coater Mar 11, 2013
The Q150T is a compact turbomolecular-pumped coating system suitable for SEM, TEM and many thin film applications. The Q150T replaces previous models K575X and K950X.
Q300T D Dual Target Sequential Sputtering System Mar 11, 2013
The Q300T D is a fully automatic, free-standing sputter coater ideally suited for thin film applications and for conductive coating of scanning electron microscopy (SEM) specimens
K1050X RF Plasma Etcher/Asher/Cleaner Mar 11, 2013
The K1050X RF plasma barrel reactor designed to meet the requirements of R&D and small-scale production for a wide and range of plasma etching, plasma ashing and plasma cleaning applications.