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Electron Beam evaporation System STE EB48 Apr 28, 2009

STE EB48 electron beam evaporation system is the simplest version for scientific research and development.

Available in both HV and UHV versions, this system is specially designed to deliver maximum flexibility of initial works in multilayer thin film technology. STE EB48 substrate holder is designed for substrate with maximum diameter of 150 mm. At the Customer's option, system can be equipped with chuck for positioning single wafers of 2”, 3”, 100mm, or multi wafers - 32”, and pieces of any shape inside diameter of 150 mm.


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