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Electron Beam evaporation System STE EB65G Apr 28, 2009

An automated production System for electron beam vapor-phase deposition in high vacuum that provides deposition of high-quality multilayer thin-film coatings onto the lot of wafers simultaneously.

STE EB65G patented vacuum system has two-chamber design. Bottom chamber with evaporation source can be separated hermetically from the top chamber with wafer holder. That is necessary for upper chamber pump down time reduction. On the other hand, the electron-beam evaporation unit is kept in high vacuum conditions and stands by to immediate use.


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