This site uses cookies. By continuing to use this site you agree to our use of cookies. To find out more, see our Privacy and Cookies policy.
Skip to the content

IOP A community website from IOP Publishing

Product details

Hiden Ion Milling Probe – End Point Detector Feb 5, 2018

The only dedicated end point determination tool for ion etch control & optimum process quality.

The IMP is a differentially pumped, ruggedized secondary ion mass spec for the analysis of secondary ions & neutrals from the ion mill process, featuring:
-High Sensitivity SIMS/MS with Pulse Ion Counting Detector
-Triple filter Quadrupole, 300amu mass range is standard
-Differentially Pumped Manifold + Mounting Flange to Process Chamber
-Ion Optics with Energy Analyser & integral ioniser
-Penning Gauge & interlocks to provide over pressure protection
-Data System with integration to the process tool
-Stability (< ±0.5% height variation over 24h)
-MASsoft control via RS232, RS485 or Ethernet LAN
-Programmable DDE, Parallel Digital I/O, RS232 Scripting Communication

Applications: End point Analysis, Target Impurity Determination, Quality Control/SPC, Residual Gas Analysis, Leak Detection


More products from this company