Nanofabrication beyond electron beam lithography Oct 15, 2010
Konrad Adenauer Allee 8
e_LiNE plus is an ultra high resolution electron beam lithography system and multi-application nanoengineering workstation.
With the e_LiNE plus, innovative research now has access to a modularly expandable research tool uniting the worlds of advanced electron beam lithography (EBL), nanoengineering, and ultra high resolution imaging & analysis. e_LiNE plus is the only EBL system which ideally combines the "classical workhorse" EBL with capabilities of a multi-application tool without compromising on state of the art lithography specifications. Still, the e_LiNE plus is pushing chip- and waferscale EBL performance in the R&D tool category.