Phantom III - Reactive Ion Etch (RIE) System Mar 16, 2011
2131 Sunnydale Blvd.
Designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries.
The system has a compact, modular design built on a space-saving platform.
"Frankly, the Phantom has been a GREAT machine since I have been a user. For this machine that has been at least 10 years. This Phantom was purchased originally by Philips where I used to work. The Phantom has followed me to Sipex and now Exar. I can't imagine living without it. It has been one of the best made and reliable plasma etchers I have used in my over 20-year career." - Don Breedlove, Failure Analysis Engineer, Exar Corporation.
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