Orion III - Plasma Enhanced Chemical Vapor Deposition (PECVD) System Mar 16, 2011

The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirements within the laboratory and pilot line production environments. The Orion III has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice.

"I've found both machines [Orion PECVD and Phantom RIE] to be quite robust, indestructible by comparison to some other lab equipment." - Lee M. Fischer, National Institute for Nanotechnology, University of Alberta

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