This site uses cookies. By continuing to use this site you agree to our use of cookies. To find out more, see our Privacy and Cookies policy.
Skip to the content

IOP A community website from IOP Publishing

Product details

Minilock-Orion III: Loadlocked Plasma Enhanced Chemical Vapor Deposition (PECVD) Mar 16, 2011

Company details

Trion Technology
2131 Sunnydale Blvd.
Clearwater
FL
33765
United States

Tel: 727-461-1888

The Minilock-Orion III is a PECVD system with a vacuum loadlock that produces production-quality films on a compact platform.

The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirements within the laboratory and pilot line production environments. The Minilock-Orion III has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice.

 

More products from this company