Product details
Sirus T2 - Table Top Reactive Ion Etch System Mar 16, 2011
Company details
Trion Technology
2131 Sunnydale Blvd.
Clearwater
FL
33765
United States
Tel:
727-461-1888
A basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal for the lab environment.
Categories
More products from this company
- Orion III - Plasma Enhanced Chemical Vapor Deposition (PECVD) System Mar 16, 2011
- Minilock-Phantom III - Reactive Ion Etcher (RIE) with a Vacuum Loadlock Mar 16, 2011
- Phantom III - Reactive Ion Etch (RIE) System Mar 16, 2011
- Minilock-Orion III: Loadlocked Plasma Enhanced Chemical Vapor Deposition (PECVD) Mar 16, 2011