Aluminum Sputtering Target Aug 23, 2011
Stanford Materials Corporation
4751 Littlejohn St. Unit A
Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest density and smallest average grain sizes for use in semiconductor, (CVD) and (PVD).
Stanford Materials Corporation (SMC) specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The unique synergy between our engineering, manufacturing and analytical teams has allowed us to produce industry leading sputtering targets. We specialize in producing custom compositions for commercial and research applications and for new proprietary technologies.
Purity:99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape:Discs, Blocks, Tubes, Sheets, Rings, Rods, User specified
Size:Circular: Diameter <250mm, Thickness >1mm; Block: Length <600mm, Width <250mm, Thickness >1mm