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Product details

Park Systems: XE-3DM Dec 8, 2011

Company details

Park Systems
KANC 4F, Iui-Dong 906-10
Suwon
Korea
Korea, Republic of

Tel: +82-31-546-6800
Fax: +82-31-546-6805

Automated Industrial AFM for High-Resolution 3D Metrology

Problem
As the dimensions of device structures continue to decrease and newer 3D structures emerge, the methods for critical dimension metrology are no longer adequate to characterize process variables. For the traditional techniques such as CD-SEM, OCD, and FIB/SEM, the limitations are becoming more apparent. For example, due to the sidewall roughness, the CD-SEM does not provide a clear definition at the structure edge, the OCD only provides an average value of the critical dimension, and the FIB/SEM provides only a single point measurement and does not provide a complete picture of the structure dimensions.

 

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