New range of combination Deposition Systems for Materials Research Dec 13, 2012

Henniker Scientific announce the release of a new range of multi-technique deposition systems for nano-materials research.
The family of systems offer the flexibility of several techniques in a single chamber, each system in the range featuring a universal quick-change’ source flange which can be configured for specific deposition techniques or combination of techniques including magnetron, thermal, e-beam or combination sources which provide a truly multi-technique, multi-deposition system ideal for both small scale production and R&D prototyping.
Efficient water cooling and differentially pumped seals guarantee UHV base pressure which, together with sample heating options, provide the widest possible access to substrate conditions.

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