Q150T Turbo-Pumped Sputter Coater/Carbon Coater Mar 11, 2013

The Q150T is available in three formats: sputtering, carbon evaporation or both. Depending upon the selected configuration, the Q150T can be a top-of-the-range sputter coater for high resolution scanning electron microscopy (SEM), a carbon coater suitable for SEM and transmission electron microscopy (TEM), or both - in a single easy-to-use system.

The ability of the Q150T to rapidly sputter a wide selection of oxidising and non-oxidising metals also makes it an ideal platform for many thin film applications.

Key features
* Metal sputtering or carbon evaporation, or both - can be combined in one space-saving design
* Fine grain sputtering for advanced high resolution FE-SEM applications
* High vacuum turbo pumping - allows sputtering of a wide range of oxidising and non-oxidising metals - suitable for SEM, high resolution FE-SEM and also for many thin film applications. NB: To avoid a short target life, it is not advisable to use targets of less than 0.3mm for coatings of 50nm or thicker in conjunction with high sputter currents. Please consider using a bonded or thicker target
* High vacuum carbon coating - ideal for SEM and TEM carbon coating applications
* Advanced 'anti-stick' carbon rod evaporation gun - simple operation, reproducible results
* Pulsed or ramped carbon coating modes - ramped evaporation can be selected for enhanced control and reproducibility of deposited carbon
* Glow discharge option - for modification of specimen surface properties (eg hydrophobic to hydrophilic conversion)
* Enhanced sputtering of aluminium using optimised pulse cleaning
* Precise thickness control using the film thickness monitor option
* Fully automatic touch screen control - rapid data input, simple operation
* Multiple, customer-defined coating schedules can be stored - ideal for multi-user laboratories
* Automatic vacuum control which can be pre-programmed to suit the process and material - no needle valve to adjust
* 'Intelligent' recognition of system - automatically detects the type of coating insert fitted
* Easy-to-change, drop-in style specimen stages (rotation stage as standard)
* Vacuum shut-down feature - leaves the process chamber under vacuum when not in use - improved vacuum performance
* Pump hold - allows the system to be held in continuous pumping mode, awaiting user input before continuing the process
* Thick film capabilities - up to 60 minutes sputtering time without breaking vacuum (rest periods automatically built in)
* Ergonomic one-piece moulded case - easy maintenance and service access
* Ethernet with local FTP server connection - simple programmer updates
* Power factor correction - complies with the current legislation (CE Certification) - efficient use of power means reduced running costs
* Three-year warranty

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