Q300T D Dual Target Sequential Sputtering System Mar 11, 2013

At the operational heart of the Q300T D is a large chamber fitted with two independent sputtering heads. This dual-head configuration allows two different metals to be sequentially sputtered without the need to 'break' vacuum. A dual channel film thickness monitor option is available.

The system is designed to sputter a wide range of oxidising metals, eg chromium (Cr) and aluminium (Al), and non-oxidising (noble) metals, eg gold (Au) and platinum (Pt).

The Q300T D sputter coater has a 300mm x 127mm work chamber and a specimen stage that accepts substrates of 2-4" wafer sizes as standard and 6" wafers with an optional stage accessory. An optional extended height glass chamber is available to enable coating of larger specimens.

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