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Product details

STE EB71 Automated station for E-Beam evaporation Dec 3, 2013

Company details

SemiTEq JSC
Engels avenue, 27, bld. 5, lit.A
Saint-Petersburg
194156
Russian Federation

Tel: +2 812 633 05 96

The system design enables to integrate it into multipurpose UHV cluster process line. Maximum quantity of wafers: 3х3” or 6х2”.

Main advantages:
• process chamber made of stainless steel with ConFlat sealing, integrated wall water cooling and dry pumping
system based on powerful ion pump 500 l/sec
• water-cooled screen for evaporated materials utilization
• system design was well proved in a semiconductor devices production of microwave electronics
• thickness uniformity less than ±2% on the substrate holder diameter up to 180 mm with a specially developed «mask» technology
• ability to optimize material consumption by changing substrate-evaporator distance, in particular, the consumption
of gold is 3-4 g/μm with rate 5 Å/sec and working distance 250 mm

 

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